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Proceedings Paper

Optical properties study of silicon oxynitride films deposited by RF magnetron sputtering
Author(s): Yong Zhu; Peifu Gu; Hui Ye; Weidong Shen
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Paper Abstract

Graded refractive index Silicon Oxy-nitride thin films were deposited by RF magnetron reactive sputtering at different N2/O2 flow ratio. The effects of gas flow ratio on the refractive index, extinction coefficient and composition were studied using UV-VIS spectrophotometer, XPS and FTIR characterization methods. A simple and accurate method is presented for determination of the optical constants and physical thickness of thin films. Which was consisted in fitting the experimental transmission curve with the help of the physical model. The relationship between composition and optical gap and dispersion energy was analyzed using Wemple DiDomenico single-oscillator model. As a result, the samples’ refractive index can be controlled from 1.92 to 1.46 by adjusting the gas flow ratio, and the optical gap lies between 5eV~6.5eV.

Paper Details

Date Published: 30 December 2004
PDF: 6 pages
Proc. SPIE 5641, MEMS/MOEMS Technologies and Applications II, (30 December 2004); doi: 10.1117/12.574768
Show Author Affiliations
Yong Zhu, Zhejiang Univ. (China)
Peifu Gu, Zhejiang Univ. (China)
Hui Ye, Zhejiang Univ. (China)
Weidong Shen, Zhejiang Univ. (China)


Published in SPIE Proceedings Vol. 5641:
MEMS/MOEMS Technologies and Applications II
Zhichun Ma; Guofan Jin; Xuyuan Chen, Editor(s)

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