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Proceedings Paper

Studies on phase Ronchi gratings and the fabrication of soft x-ray condenser zone plates
Author(s): Ying Liu; Jun Lou; Kai Xiao; Xiangdong Xu; Yilin Hong; Shaojun Fu
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Paper Abstract

Ronchi gratings are widely used as beam splitters in interferometry. The phase Ronchi gratings are fabricated in K9 (or BK7) substrates using a photolithographic process and ion beam etching process. The geometry of the gratings was determined within the approximations of the scalar diffraction theory to minimize their diffraction intensities in 0 and 2 orders at 514.5nm. Their diffractive characteristics are measured using Ar+ laser at 514.5 and 496.5nm. The phase Ronchi gratings exhibit the diffraction intensity in 0 or 2 order to be three orders of magnitude less than that in 1 order. Soft x-ray condenser zone plates are one of the most essential condensing and dispersing elements in the field of soft x-ray microscopy. The zone-plates are used at 3.2nm, whose diameters are 2.8mm. The widths of their outermost zone are 647nm. The zone plate is made of Au. Self-supporting zone plates are fabricated by holography-ion beam etching process to obtain x-ray lithography mask, the x-ray lithography, photolithography and micro electroplating process were used to obtain their self-supporting structure. The self-supporting zone plates are free of membrane absorption and degradation.

Paper Details

Date Published: 7 February 2005
PDF: 9 pages
Proc. SPIE 5636, Holography, Diffractive Optics, and Applications II, (7 February 2005); doi: 10.1117/12.574391
Show Author Affiliations
Ying Liu, Univ. of Science and Technology of China (China)
Jun Lou, Univ. of Science and Technology of China (China)
Kai Xiao, Univ. of Science and Technology of China (China)
Xiangdong Xu, Univ. of Science and Technology of China (China)
Yilin Hong, Univ. of Science and Technology of China (China)
Shaojun Fu, Univ. of Science and Technology of China (China)


Published in SPIE Proceedings Vol. 5636:
Holography, Diffractive Optics, and Applications II
Yunlong Sheng; Dahsiung Hsu; Chongxiu Yu; Byoungho Lee, Editor(s)

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