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Proceedings Paper

Study on photodamage of In:Er:LiNbO3 crystal waveguide substrates
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Paper Abstract

In:Er:LiNbO3 crystals with fixed Er concentration of 1mol% and variable In concentration of 1mol%, 2mol% and 3mol% have been grown by the Czochralski method, and then was made into waveguide substrates. The directly observing facula method was employed to measure the photo-damage resistance ability of the substrates, and it is found that In(3mol%):Er:LiNbO3 has the highest photo-damage resistance ability among these three substrates. The structure was determined by the infrared transmittance spectra and the UV absorption spectra. The mechanism that the photo-damage resistance ability of the substrates increases with the increase of the doped concentration of In was discussed via the structure of the crystal.

Paper Details

Date Published: 3 January 2005
PDF: 4 pages
Proc. SPIE 5643, Advances in Optical Data Storage Technology, (3 January 2005); doi: 10.1117/12.574202
Show Author Affiliations
Wusheng Xu, Harbin Institute of Technology (China)
Yuheng Xu, Harbin Institute of Technology (China)
Jian Zhang, Harbin Institute of Technology (China)


Published in SPIE Proceedings Vol. 5643:
Advances in Optical Data Storage Technology
Duanyi Xu; Kees A. Schouhamer Immink; Keiji Shono, Editor(s)

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