Share Email Print
cover

Proceedings Paper

Visualization techniques for ghost in complex systems: examples from the technical integration line
Author(s): Shitao Deng; Xiaotong Li; Zhaofeng Cen; Qihua Zhu; Fang Wang; Hongjie Liu
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

The technical integration line (TIL), which is the full scale prototype for Shengguang-III laser facility (SG-III), now under construction at CAEP, will contain a neodymium glass laser system with more than 70 large (40-100 cm) optical components. Reflections from these surfaces (so-called ghost reflections) are numerous and extensive computation has been required to track them in the TIL optical system. The tremendous number of ghost paths requires a visualization method that allows overlapping ghosts on optics, and then sums them up to illustrate its potential damage on critical surfaces. Therefore, how to make an effective identification and visualization of multi-order "ghost" has been a major part of the optical design effort. This paper addresses the following aspects of TIL ghost analysis: 1, comparison of several methods for ghost energy simulation. 2, some techniques for visualization of complex optical systems in 3D space including mirrors and pinholes. 3, attempts at visualizing “ghost energy” distribution near some critical surfaces so as to provide detailed references for mitigation of ghost caused damage.

Paper Details

Date Published: 26 January 2005
PDF: 7 pages
Proc. SPIE 5627, High-Power Lasers and Applications III, (26 January 2005); doi: 10.1117/12.574016
Show Author Affiliations
Shitao Deng, Zhejiang Univ. (China)
Xiaotong Li, Zhejiang Univ. (China)
Zhaofeng Cen, Zhejiang Univ. (China)
Qihua Zhu, China Academy of Engineering Physics (China)
Fang Wang, China Academy of Engineering Physics (China)
Hongjie Liu, China Academy of Engineering Physics (China)


Published in SPIE Proceedings Vol. 5627:
High-Power Lasers and Applications III
Dianyuan Fan; Ken-ichi Ueda; Jongmin Lee, Editor(s)

© SPIE. Terms of Use
Back to Top