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Adaptive CD APC with dose, focus, and thin film thickness
Author(s): Ziqiang John Mao
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Proc. SPIE 5645, Advanced Microlithography Technologies, ; doi: 10.1117/12.573931
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Ziqiang John Mao, Intel Corp. (United States)


Published in SPIE Proceedings Vol. 5645:
Advanced Microlithography Technologies
Yangyuan Wang; Jun-en Yao; Christopher J. Progler, Editor(s)

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