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Proceedings Paper

A new method for measuring a small displacement by using the critical angle method and confocal technology
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Paper Abstract

A new method for measuring a very small displacement is presented. The principles of the measurement are based on the critical angle method and confocal technology. It will increase the lateral and longitudinal resolutions higher than 0.3μm and 5nm, respectively, and the maximum displacement could be above 12μm. This optical structure could be applied to measure some messages for optical surface, bio-medical science, and nanotechnology in the future. The new technique has some merits, such as a simple and compact optical setup, high sensitivity, and high resolution.

Paper Details

Date Published: 9 February 2005
PDF: 8 pages
Proc. SPIE 5635, Nanophotonics, Nanostructure, and Nanometrology, (9 February 2005); doi: 10.1117/12.572739
Show Author Affiliations
Shu-Jen Liao, National Huwei Univ. of Science and Technology (Taiwan)
Shinn-Fwu Wang, Ching Yun Univ. (Taiwan)
Ming-Hung Chiu, National Huwei Univ. of Science and Technology (Taiwan)


Published in SPIE Proceedings Vol. 5635:
Nanophotonics, Nanostructure, and Nanometrology
Xing Zhu; Stephen Y. Chou; Yasuhiko Arakawa, Editor(s)

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