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Proceedings Paper

Theoretical and experimental comparison of splashing in deposition of copper and graphite thin films by PLD
Author(s): M. Khaleeq-ur-Rahman; Muhammad Shahbaz Anwar; M. Shahid Rafique; Hafza Faiz; Khurram Siraj
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Paper Abstract

This paper represents the comparison results of experimental observations and theoretical calculations for splashing in deposition of Copper and Graphite thin films. These films were deposited by Pulsed Laser Deposition (PLD) technique. A Q-Switched Nd:YAG nano-second laser with 1.1 MW power. Thin films and Target surface morphology were studied under the Scanning Electron Microscope (SEM) Splashing was observed only in the copper thin films but not in graphite thin film. Theoretical models also shows the splashing only in copper, not in graphite at 1012 W/cm2 intensity of laser radiation. Because skin depth for copper (of the order of nm) smaller than that of graphite (of the order of μm) for IR radiation. Skin depth is directly related with splashing threshold intensity. Splashing produced that nonuniformity in thin films which reduced application of thin films especially in nano-electronics and smart materials.

Paper Details

Date Published: 23 February 2005
PDF: 4 pages
Proc. SPIE 5650, Micro- and Nanotechnology: Materials, Processes, Packaging, and Systems II, (23 February 2005); doi: 10.1117/12.572633
Show Author Affiliations
M. Khaleeq-ur-Rahman, Univ. of Engineering and Technology Lahore (Pakistan)
Muhammad Shahbaz Anwar, Univ. of Engineering and Technology Lahore (Pakistan)
M. Shahid Rafique, Univ. of Engineering and Technology Lahore (Pakistan)
Hafza Faiz, Univ. of Engineering and Technology Lahore (Pakistan)
Khurram Siraj, Univ. of Engineering and Technology Lahore (Pakistan)


Published in SPIE Proceedings Vol. 5650:
Micro- and Nanotechnology: Materials, Processes, Packaging, and Systems II
Jung-Chih Chiao; David N. Jamieson; Lorenzo Faraone; Andrew S. Dzurak, Editor(s)

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