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Proceedings Paper

Highly damage-resistant reflectors for 248 nm formed by fluorides multilayers
Author(s): Takao Izawa; N. Yamamura; R. Uchimura; I. Hashimoto; T. Yakuoh; Yoshiro Owadano; Yuji Matsumoto; M. Yano
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Paper Abstract

we investigated the laser damage thresholds and optical performances of fluorides multi-layered reflectors, consisting of middle index fluoride and Na3AlF, for high power KrF laser applications. It was found the damage thresholds of those reflectors are significantly improved by laser annealing. Those reflectors with annealing resisted against the fluence of 18-27 J/cm2 (this fluence varies on combinations of various fluorides) for 248 n, 15 nsec, 10Hz pulses.

Paper Details

Date Published: 1 June 1991
PDF: 6 pages
Proc. SPIE 1441, Laser-Induced Damage in Optical Materials: 1990, (1 June 1991); doi: 10.1117/12.57242
Show Author Affiliations
Takao Izawa, Showa Optical Co., Ltd. (Japan)
N. Yamamura, Showa Optical Co., Ltd. (Japan)
R. Uchimura, Showa Optical Co., Ltd. (Japan)
I. Hashimoto, Showa Optical Co., Ltd. (Japan)
T. Yakuoh, Showa Optical Co., Ltd. (Japan)
Yoshiro Owadano, Electrotechnical Lab. (Japan)
Yuji Matsumoto, Electrotechnical Lab. (Japan)
M. Yano, Electrotechnical Lab. (Japan)

Published in SPIE Proceedings Vol. 1441:
Laser-Induced Damage in Optical Materials: 1990
Harold E. Bennett; Lloyd L. Chase; Arthur H. Guenther; Brian Emerson Newnam; M. J. Soileau, Editor(s)

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