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Proceedings Paper

Morphology and laser damage studies by atomic force microscopy of e-beam evaporation deposited antireflection and high-reflection coatings
Author(s): Aleta A. Tesar; Mehdi Balooch; K. W. Shotts; Wigbert J. Siekhaus
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Paper Abstract

Atomic force microscopy (AFM) is a powerful tool for studying the surface morphology of dielectric thin film coatings. Results of AFM scanning of antireflection and high reflection coatings are presented. These results demonstrate the effectivenss of AFM in providing high resolution monitoring of processing defects, laser damage, and laser conditioning and aging in e-beam evaporation deposited films.

Paper Details

Date Published: 1 June 1991
PDF: 9 pages
Proc. SPIE 1441, Laser-Induced Damage in Optical Materials: 1990, (1 June 1991); doi: 10.1117/12.57239
Show Author Affiliations
Aleta A. Tesar, Lawrence Livermore National Lab. (United States)
Mehdi Balooch, Lawrence Livermore National Lab. (United States)
K. W. Shotts, Lawrence Livermore National Lab. (United States)
Wigbert J. Siekhaus, Lawrence Livermore National Lab. (United States)


Published in SPIE Proceedings Vol. 1441:
Laser-Induced Damage in Optical Materials: 1990
Harold E. Bennett; Lloyd L. Chase; Arthur H. Guenther; Brian Emerson Newnam; M. J. Soileau, Editor(s)

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