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Proceedings Paper

Thermal analysis of multifacet-mirror ring resonator for XUV free-electron lasers
Author(s): Brian D. McVey; John C. Goldstein; Robert D. McFarland; Brian Emerson Newnam
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Paper Abstract

xUv (10 nm -100 nm) free-electron lasers (EELs) are potentially important light sources for advanced lithography and materials applications. The average power of an XUV EEL oscillator may be urnited by thermal loading of the resonator mirrors. We analyze the requirements for the thennal performance of the mirrors of a metal multifacet-mirror ring resonator for use at 12 nm. We use analytical methods and numerical approaches which include simulations with the 3-D EEL code FELEX. Thermal distortion of mirror surfaces leads to optical wavefront aberrations which reduce the focusability of the light beam in the gain medium (wiggler/electron beam) and limit the laser performance.

Paper Details

Date Published: 1 June 1991
PDF: 12 pages
Proc. SPIE 1441, Laser-Induced Damage in Optical Materials: 1990, (1 June 1991); doi: 10.1117/12.57237
Show Author Affiliations
Brian D. McVey, Los Alamos National Lab. (United States)
John C. Goldstein, Los Alamos National Lab. (United States)
Robert D. McFarland, Los Alamos National Lab. (United States)
Brian Emerson Newnam, Los Alamos National Lab. (United States)

Published in SPIE Proceedings Vol. 1441:
Laser-Induced Damage in Optical Materials: 1990
Harold E. Bennett; Lloyd L. Chase; Arthur H. Guenther; Brian Emerson Newnam; M. J. Soileau, Editor(s)

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