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Proceedings Paper

Ion-assisted deposition of graded index silicon oxynitride coatings
Author(s): Ghanim A. Al-Jumaily; F. J. Gagliardi; P. McColl; Lawrence J. Mizerka
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Paper Abstract

Graded index coatings of silicon oxynitride have been deposited using ion assisted deposition (IAD). During the IAD process the coated surface is bombarded with low energy reactive ions such that the chemical properties of the coating can be changed in a controlled fashion. We have shown that the chemical composition of SiN(x)O(y) can be varied continuously from silicon nitride to silicon oxide. As a result, the index of refraction of the coatings can be varied between 2.1 and 1.45 by varying the gas mixture in the coating system. The process has been used to deposit graded index antireflection coatings and rugate filters. Several diagnostic techniques were employed to examine the optical, mechanical, and chemical properties of the coatings.

Paper Details

Date Published: 1 June 1991
PDF: 5 pages
Proc. SPIE 1441, Laser-Induced Damage in Optical Materials: 1990, (1 June 1991); doi: 10.1117/12.57218
Show Author Affiliations
Ghanim A. Al-Jumaily, Barr Associates, Inc. (United States)
F. J. Gagliardi, Barr Associates, Inc. (United States)
P. McColl, Barr Associates, Inc. (United States)
Lawrence J. Mizerka, U.S. Army Materials Technology Lab. (United States)

Published in SPIE Proceedings Vol. 1441:
Laser-Induced Damage in Optical Materials: 1990
Harold E. Bennett; Lloyd L. Chase; Arthur H. Guenther; Brian Emerson Newnam; M. J. Soileau, Editor(s)

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