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Proceedings Paper

286-TW Ti:sapphire laser at CAEP
Author(s): Hansheng Peng; Xiaojun Huang; Qihua Zhu; Xiaodong Wang; K. Zhou; Xiaofeng Wei; Lianqin Liu; Xiaoming Zeng; Yi Guo; Donghui Lin; Xiaodong Yuan; Bing Xu; Longbo Xu; Xiaoliang Chu; Xiaomin Zhang; Liejia Qian
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Paper Abstract

We have built a three-stage Ti:sapphire laser system at CAEP which could deliver 5-TW, 30-TW and 286-TW pulses to the corresponding target chambers for diverse applications with innovative high-power Ti:sapphire crystal amplifiers. Pulse durations of 30fs have been obtained by installing an acousto-optic programmable dispersive filter (AOPDF) before the stretcher to compensate for the spectral gain narrowing. By taking a number of advanced measures for spatial beam control, near-diffraction limited focal spots (FWHM) have been obtained which, to our knowledge, are the best far fields ever measured for the existing high-power Ti:sapphire laser systems without deformable mirror correction. Focused laser intensity is about 1021W/cm2 measured with an f/1.7 OAP. The laser system has the potential to operate at 500TW and even higher and laser intensities of 1022W/cm2 are expected with deformable mirror for wavefront correction and small f-number fine OAP for tighter focus added to the system in the near future.

Paper Details

Date Published: 26 January 2005
PDF: 5 pages
Proc. SPIE 5627, High-Power Lasers and Applications III, (26 January 2005); doi: 10.1117/12.572096
Show Author Affiliations
Hansheng Peng, China Academy of Engineering Physics (China)
Xiaojun Huang, China Academy of Engineering Physics (China)
Qihua Zhu, China Academy of Engineering Physics (China)
Xiaodong Wang, China Academy of Engineering Physics (China)
K. Zhou, China Academy of Engineering Physics (China)
Xiaofeng Wei, China Academy of Engineering Physics (China)
Lianqin Liu, China Academy of Engineering Physics (China)
Xiaoming Zeng, China Academy of Engineering Physics (China)
Yi Guo, China Academy of Engineering Physics (China)
Donghui Lin, China Academy of Engineering Physics (China)
Xiaodong Yuan, China Academy of Engineering Physics (China)
Bing Xu, China Academy of Engineering Physics (China)
Longbo Xu, China Academy of Engineering Physics (China)
Xiaoliang Chu, China Academy of Engineering Physics (China)
Xiaomin Zhang, China Academy of Engineering Physics (China)
Liejia Qian, Fudan Univ. (China)


Published in SPIE Proceedings Vol. 5627:
High-Power Lasers and Applications III
Dianyuan Fan; Ken-ichi Ueda; Jongmin Lee, Editor(s)

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