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Proceedings Paper

A plasma etching perspective of patterning novel materials and small structures
Author(s): Jane P. Chang
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Paper Abstract

Plasma etching is an enabling technology to pattern novel materials and to generate small structures. This paper provides a plasma etching perspective in the era of nanofabrication, using the definition of the gate structure of a metal-oxide-semiconductor field effect transistor (MOSFET) as an example, followed by the importance of predictive modeling, and finally the application challenges of plasma etching in fabricating micro-chemical and biological sensors.

Paper Details

Date Published: 19 January 2005
PDF: 6 pages
Proc. SPIE 5592, Nanofabrication: Technologies, Devices, and Applications, (19 January 2005); doi: 10.1117/12.571790
Show Author Affiliations
Jane P. Chang, Univ. of California/Los Angeles (United States)

Published in SPIE Proceedings Vol. 5592:
Nanofabrication: Technologies, Devices, and Applications
Warren Y-C. Lai; Stanley Pau; O. Daniel Lopez, Editor(s)

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