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Proceedings Paper

Low-energy electron beam irradiation promoted selective cleavage of surface furoxan
Author(s): Chang Ok Kim; Jie Won Jung; Minju Kim; Tai-Hee Kang; Kyuwook Ihm; Ki-Jeong Kim; Bongsoo Kim; Joon Won Park; Hyun-Woo Nam; Kwang-Jin Hwang
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Paper Abstract

In the gas phase, electron beam irradiation of a furoxan molecule results in the production of two NO molecules and concomitant generation of a triple bond. In this study, we examined whether the selective cleavage of furoxan occurs on the surface of silicon wafers. A furoxan-substituted imine layer was prepared by the reaction of aminosilylated silicon wafers with 4-furoxancarbaldehyde. Formation of the imine layer was confirmed by UV-vis spectroscopy, contact angle goniometry, ellipsometry, and XPS. XPS spectroscopic monitoring of the electron beam (400 eV) induced reaction of the modified silicon wafers showed that two of the furoxan ring nitrogen atoms were lost. To determine if a carbon-carbon triple bond had been generated in the surface product of this reaction, FT-IR spectroscopy and NEXAFS (Near Edge X-ray Absorption Fine Structure) were performed. A weak absorption at 2203 cm-1 was observed in the FT-IR spectrum, reflecting the presence of a triple bond. The carbon K-edge NEXAFS spectrum contained a π*(C≡C) peak at 286.5 eV. Based on these results, we conclude that electron beam irradiation of the furoxan, incorporated on a silicon wafer surface, results in the release of nitrogen oxide and the formation of a triple bond containing product.

Paper Details

Date Published: 29 December 2004
PDF: 10 pages
Proc. SPIE 5593, Nanosensing: Materials and Devices, (29 December 2004); doi: 10.1117/12.570071
Show Author Affiliations
Chang Ok Kim, Pohang Univ. of Science and Technology (South Korea)
Jie Won Jung, Pohang Univ. of Science and Technology (South Korea)
Minju Kim, Pohang Univ. of Science and Technology (South Korea)
Tai-Hee Kang, Pohang Univ. of Science and Technology (South Korea)
Kyuwook Ihm, Pohang Univ. of Science and Technology (South Korea)
Ki-Jeong Kim, Pohang Univ. of Science and Technology (South Korea)
Bongsoo Kim, Pohang Univ. of Science and Technology (South Korea)
Joon Won Park, Pohang Univ. of Science and Technology (South Korea)
Hyun-Woo Nam, Hongik Univ. (South Korea)
Kwang-Jin Hwang, Hongik Univ. (South Korea)


Published in SPIE Proceedings Vol. 5593:
Nanosensing: Materials and Devices
M. Saif Islam; Achyut K. Dutta, Editor(s)

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