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Proceedings Paper

Post printing optimization with chromeless phase-shifting mask
Author(s): Yung-Tin Chen
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Date Published:
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Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, ; doi: 10.1117/12.569868
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Yung-Tin Chen, Matrix Semiconductor (United States)


Published in SPIE Proceedings Vol. 5567:
24th Annual BACUS Symposium on Photomask Technology
Wolfgang Staud; J. Tracy Weed, Editor(s)

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