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Proceedings Paper

Proposal of using EUVL for PXL
Author(s): Kiwamu Takehisa
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Paper Abstract

A new idea of writing a PXL (Proximity X-ray Lithography) mask is presented, in which a EUVL (extreme ultraviolet lithography) exposure tool is used as a mask repeater. EUV power of less than 1W is enough to write a PXL mask within 5 minutes, and an expensive EUV mask blank can be recycled because the mother mask is not necessary once a PXL mask is written. A EUV mask repeater especially consisting of a high-NA Micro Exposure Tool (MET) makes it possible to write a PXL mask for the 32 nm nodes and after. The new system can also be applied to other lithography tools using a 1X: such as LEEPL (Low Energy E-Beam Proximity Lithography) and imprint lithography.

Paper Details

Date Published: 6 December 2004
PDF: 7 pages
Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); doi: 10.1117/12.569651
Show Author Affiliations
Kiwamu Takehisa, Tohoku Univ. (Japan)


Published in SPIE Proceedings Vol. 5567:
24th Annual BACUS Symposium on Photomask Technology
Wolfgang Staud; J. Tracy Weed, Editor(s)

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