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Proceedings Paper

Discriminating submicron lithography process variations with a white light confocal scanning optical microscope
Author(s): Frank S. Menagh; Guoqing Xiao; Mircea V. Dusa
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Paper Details

Date Published: 1 January 1992
PDF: 11 pages
Proc. SPIE 1604, 11th Annual BACUS Symposium on Photomask Technology, (1 January 1992); doi: 10.1117/12.56956
Show Author Affiliations
Frank S. Menagh, Technical Instrument Co. (United States)
Guoqing Xiao, Technical Instrument Co. (United States)
Mircea V. Dusa, Seeq Technology, Inc. (United States)

Published in SPIE Proceedings Vol. 1604:
11th Annual BACUS Symposium on Photomask Technology
Kevin C. McGinnis, Editor(s)

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