Share Email Print
cover

Proceedings Paper

Discriminating submicron lithography process variations with a white light confocal scanning optical microscope
Author(s): Frank S. Menagh; Guoqing Xiao; Mircea V. Dusa
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Details

Date Published: 1 January 1992
PDF: 11 pages
Proc. SPIE 1604, 11th Annual BACUS Symposium on Photomask Technology, (1 January 1992); doi: 10.1117/12.56956
Show Author Affiliations
Frank S. Menagh, Technical Instrument Co. (United States)
Guoqing Xiao, Technical Instrument Co. (United States)
Mircea V. Dusa, Seeq Technology, Inc. (United States)


Published in SPIE Proceedings Vol. 1604:
11th Annual BACUS Symposium on Photomask Technology
Kevin C. McGinnis, Editor(s)

© SPIE. Terms of Use
Back to Top