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Proceedings Paper

Chemical characteristics of negative-tone chemically amplified resist for advanced mask making: II
Author(s): Kazumasa Takeshi; Masahito Tanabe; Daisuke Inokuchi; Yuichi Fukushima; Yasuhiro Okumoto; Yoshimitsu Okuda
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Paper Abstract

We investigated the film property and the lithographic performance of five commercialized NCARs. This report focused on Cr effect and PCD stability which are critical issues on advanced mask making. Results confirmed to solve the Cr effect by controlled dissolution rate of resist film. Furthermore, PCD was occurred by PAG moving and unsuitable reaction in the resist film standing delay time. This report suggests the strategy that was design of chemical structure for the next generation NCARs.

Paper Details

Date Published: 6 December 2004
PDF: 8 pages
Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); doi: 10.1117/12.569516
Show Author Affiliations
Kazumasa Takeshi, Toppan Printing Co., Ltd. (Japan)
Masahito Tanabe, Toppan Printing Co., Ltd. (Japan)
Daisuke Inokuchi, Toppan Printing Co., Ltd. (Japan)
Yuichi Fukushima, Toppan Printing Co., Ltd. (Japan)
Yasuhiro Okumoto, Toppan Printing Co., Ltd. (Japan)
Yoshimitsu Okuda, Toppan Printing Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 5567:
24th Annual BACUS Symposium on Photomask Technology
Wolfgang Staud; J. Tracy Weed, Editor(s)

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