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Proceedings Paper

Issues associated with the commercialization of phase-shift masks
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Paper Details

Date Published: 1 January 1992
PDF: 29 pages
Proc. SPIE 1604, 11th Annual BACUS Symposium on Photomask Technology, (1 January 1992); doi: 10.1117/12.56947
Show Author Affiliations
John L. Nistler, Advanced Micro Devices, Inc. (United States)
Greg P. Hughes, DuPont Photomasks (United States)
Andrew J. Muray, ETEC Systems, Inc. (United States)
James N. Wiley, KLA Instruments Corp. (United States)


Published in SPIE Proceedings Vol. 1604:
11th Annual BACUS Symposium on Photomask Technology
Kevin C. McGinnis, Editor(s)

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