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Proceedings Paper

Phase-shifting mask design tool
Author(s): David M. Newmark; Andrew R. Neureuther
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Paper Details

Date Published: 1 January 1992
PDF: 10 pages
Proc. SPIE 1604, 11th Annual BACUS Symposium on Photomask Technology, (1 January 1992); doi: 10.1117/12.56946
Show Author Affiliations
David M. Newmark, Univ. of California/Berkeley (United States)
Andrew R. Neureuther, Univ. of California/Berkeley (United States)


Published in SPIE Proceedings Vol. 1604:
11th Annual BACUS Symposium on Photomask Technology
Kevin C. McGinnis, Editor(s)

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