Share Email Print

Proceedings Paper

Zero-bias PBS process for 5X reticles
Author(s): Regine G. Tarascon-Auriol; Christophe Pierrat; Michael W. Stohl; Christopher P. Braun; James Burdorf; Sheila Vaidya
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

A set of experiments to identify a zero-bias PBS1 process for 5X reticles is described. Parameters such as electron-beam dose, developer strength, baking mode and development mode have been optimized for unbiased PBS reticles. Line edge quality and defect density data will be presented. No rough edges were detected when reticles were run on KLA 208 type machine with one pixel sensitivity (0.36 pm minimum defect size). Plate quality was characterized by Scanning Electron Microscopy (SEM), optical Critical Dimension (CD) and line-edge roughness measurement techniques using Leica Laser Measurement System (LMS 2000) and Etec MEBESIII. It appears that the proposed benefits of biased processes over unbiased ones, namely smoother edge quality and lower defect density, have been overcome by the improvements in the processes, the quality of the raw materials and cleanroom facilities and practices. Statistical data on these parameters will be presented.

Paper Details

Date Published: 1 January 1992
PDF: 14 pages
Proc. SPIE 1604, 11th Annual BACUS Symposium on Photomask Technology, (1 January 1992); doi: 10.1117/12.56944
Show Author Affiliations
Regine G. Tarascon-Auriol, AT&T Bell Labs. (United States)
Christophe Pierrat, AT&T Bell Labs. (United States)
Michael W. Stohl, AT&T Bell Labs. (United States)
Christopher P. Braun, AT&T Bell Labs. (United States)
James Burdorf, AT&T Bell Labs. (United States)
Sheila Vaidya, AT&T Bell Labs. (United States)

Published in SPIE Proceedings Vol. 1604:
11th Annual BACUS Symposium on Photomask Technology
Kevin C. McGinnis, Editor(s)

© SPIE. Terms of Use
Back to Top