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Proceedings Paper

Alternative to die-to-database mask inspection
Author(s): Parkson W Chen
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Paper Abstract

Qualification of a reticle is a very important step for a mask shop. For defect inspection, automatic die to die inspection can detect the random defects and the die to database inspection system can detect the missing patterns as well as the pattern placement of the reticle. When die size becomes larger, and the field size of the stepper lens is limited,it is a common practice that only one die is placed on a reticle.

Paper Details

Date Published: 1 January 1992
PDF: 11 pages
Proc. SPIE 1604, 11th Annual BACUS Symposium on Photomask Technology, (1 January 1992); doi: 10.1117/12.56941
Show Author Affiliations
Parkson W Chen, Taiwan Mask Corp. (Taiwan)


Published in SPIE Proceedings Vol. 1604:
11th Annual BACUS Symposium on Photomask Technology
Kevin C. McGinnis, Editor(s)

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