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Proceedings Paper

Printability of pellicle defects in DUV 0.5-um lithography
Author(s): Pei-yang Yan; Michael S. Yeung; Henry T. Gaw
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Paper Details

Date Published: 1 January 1992
PDF: 12 pages
Proc. SPIE 1604, 11th Annual BACUS Symposium on Photomask Technology, (1 January 1992); doi: 10.1117/12.56939
Show Author Affiliations
Pei-yang Yan, Intel Corp. (United States)
Michael S. Yeung, Univ. of California/Berkeley (United States)
Henry T. Gaw, Intel Corp. (United States)


Published in SPIE Proceedings Vol. 1604:
11th Annual BACUS Symposium on Photomask Technology
Kevin C. McGinnis, Editor(s)

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