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Proceedings Paper

Comparison of reflective mask technologies for soft x-ray projection lithography
Author(s): Donald M. Tennant; John E. Bjorkholm; Ludwig Eichner; Richard R. Freeman; Tanya E. Jewell; Alastair A. MacDowell; J. Z. Pastalan; L. H. Szeto; Warren K. Waskiewicz; Donald L. White; David L. Windt; Obert R. Wood
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Paper Details

Date Published: 1 January 1992
PDF: 14 pages
Proc. SPIE 1604, 11th Annual BACUS Symposium on Photomask Technology, (1 January 1992); doi: 10.1117/12.56938
Show Author Affiliations
Donald M. Tennant, AT&T Bell Labs. (United States)
John E. Bjorkholm, AT&T Bell Labs. (United States)
Ludwig Eichner, AT&T Bell Labs. (United States)
Richard R. Freeman, AT&T Bell Labs. (United States)
Tanya E. Jewell, AT&T Bell Labs. (United States)
Alastair A. MacDowell, Brookhaven National Lab. (United States)
J. Z. Pastalan, AT&T Bell Labs. (United States)
L. H. Szeto, AT&T Bell Labs. (United States)
Warren K. Waskiewicz, AT&T Bell Labs. (United States)
Donald L. White, AT&T Bell Labs. (United States)
David L. Windt, AT&T Bell Labs. (United States)
Obert R. Wood, AT&T Bell Labs. (United States)


Published in SPIE Proceedings Vol. 1604:
11th Annual BACUS Symposium on Photomask Technology
Kevin C. McGinnis, Editor(s)

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