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Proceedings Paper

Advanced e-beam lithography system in producing high-quality reticle for 64M-DRAM
Author(s): Katsuhiro Kawasaki; Kazumitsu Nakamura; Takashi Matsuzaka; Hiroya Ohta; Norio Saitou; Toshihiko Kohno; Morihisa Hoga
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Paper Details

Date Published: 1 January 1992
PDF: 13 pages
Proc. SPIE 1604, 11th Annual BACUS Symposium on Photomask Technology, (1 January 1992); doi: 10.1117/12.56937
Show Author Affiliations
Katsuhiro Kawasaki, Hitachi, Ltd. (Japan)
Kazumitsu Nakamura, Hitachi, Ltd. (Japan)
Takashi Matsuzaka, Hitachi, Ltd. (Japan)
Hiroya Ohta, Hitachi, Ltd. (Japan)
Norio Saitou, Hitachi, Ltd. (Japan)
Toshihiko Kohno, Hitachi, Ltd. (Japan)
Morihisa Hoga, Hitachi, Ltd. (Japan)


Published in SPIE Proceedings Vol. 1604:
11th Annual BACUS Symposium on Photomask Technology
Kevin C. McGinnis, Editor(s)

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