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Proceedings Paper

Reflective masks for 1X deep ultraviolet lithography
Author(s): Robert L. Hsieh; Julienne Yu-Hey Lee; Nadim I. Maluf; Raymond Browning; Paul Jerabek; Roger Fabian W. Pease; Gerry Owen
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Paper Details

Date Published: 1 January 1992
PDF: 11 pages
Proc. SPIE 1604, 11th Annual BACUS Symposium on Photomask Technology, (1 January 1992); doi: 10.1117/12.56936
Show Author Affiliations
Robert L. Hsieh, Stanford Univ. (United States)
Julienne Yu-Hey Lee, Stanford Univ. (United States)
Nadim I. Maluf, Stanford Univ. (United States)
Raymond Browning, Stanford Univ. (United States)
Paul Jerabek, Stanford Univ. (United States)
Roger Fabian W. Pease, Stanford Univ. (United States)
Gerry Owen, Hewlett-Packard Co. (United States)

Published in SPIE Proceedings Vol. 1604:
11th Annual BACUS Symposium on Photomask Technology
Kevin C. McGinnis, Editor(s)

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