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Proceedings Paper

Pattern generator specification for phase-shift 5X reticles
Author(s): Jacques Trotel
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Paper Details

Date Published: 1 January 1992
PDF: 10 pages
Proc. SPIE 1604, 11th Annual BACUS Symposium on Photomask Technology, (1 January 1992); doi: 10.1117/12.56934
Show Author Affiliations
Jacques Trotel, European Lithography Innovation SA (France)


Published in SPIE Proceedings Vol. 1604:
11th Annual BACUS Symposium on Photomask Technology
Kevin C. McGinnis, Editor(s)

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