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Proceedings Paper

Positional errors due to substrate charging in e-beam lithography tools
Author(s): Maris A. Sturans; Jacek G. Smolinski; Jeffrey A. Robinson
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Paper Details

Date Published: 1 January 1992
PDF: 9 pages
Proc. SPIE 1604, 11th Annual BACUS Symposium on Photomask Technology, (1 January 1992); doi: 10.1117/12.56933
Show Author Affiliations
Maris A. Sturans, IBM/General Technology Div. (United States)
Jacek G. Smolinski, IBM/General Technology Div. (United States)
Jeffrey A. Robinson, IBM/General Technology Div. (United States)


Published in SPIE Proceedings Vol. 1604:
11th Annual BACUS Symposium on Photomask Technology
Kevin C. McGinnis, Editor(s)

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