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Proceedings Paper

Automated critical dimension and registration communication
Author(s): Paul DePesa; Todd E. Pegelow
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Paper Abstract

Communication and verification of information has historically been an important and significant part of mask order entry. Although SEMI defined and adopted a specification for a mask order entry data base, it has met numerous practical obstacles and has not yet been widely accepted or implemented. Concise and clear communication of information between designer and mask vendor, between departments within the mask vendor's organization and ultimately to the wafer fab continues to be an error-prone, paper-based system. The project undertaken here addresses, through software tools, the specification and communication of "specific points of interest". These points may be, but are not limited to, critical dimension marks, registration marks, specific geometries or areas in question. Data markers may be added into the binary data file at any point in the process from design to mask data preparation to mask manufacturing and inspection to wafer fab. Several marker types are available and may be defined and utilized at the users' discretion. Each marker may have an associated comment and may be instantly called up and displayed graphically. Once these markers are defined and stored they are then communicated through the binary data file or job deck file. A designer may place markers indicating critical dimensions to be measured, along with their intended data and mask dimensions, store them into the design library and communicate them to the mask vendor through that library. The defined markers are passed from design data base into E-beam or optical lithography format as the data is fractured. Markers specifying critical dimensions may be automatically verified by the software or manually by the operator. Similarly, these critical dimension or registration markers may be used to generate run control files for automated CD and/or registration measurement equipment.

Paper Details

Date Published: 1 January 1992
PDF: 8 pages
Proc. SPIE 1604, 11th Annual BACUS Symposium on Photomask Technology, (1 January 1992); doi: 10.1117/12.56932
Show Author Affiliations
Paul DePesa, Diamon Images (United States)
Todd E. Pegelow, Transcription Enterprises Ltd. (United States)


Published in SPIE Proceedings Vol. 1604:
11th Annual BACUS Symposium on Photomask Technology
Kevin C. McGinnis, Editor(s)

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