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Interaction of mask manufacturability and alt-PSM design parameters
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Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, ; doi: 10.1117/12.569303
Show Author Affiliations
Paul J. M. van Adrichem, Synopsys, Inc. (United States)
Bryan Kasprowicz, Photronics, Inc. (United States)
Geert Vandenberghe, IMEC (Belgium)
Kevin Beaudette, Synopsys, Inc. (United States)
Michael E. Kling, Synopsys, Inc. (United States)


Published in SPIE Proceedings Vol. 5567:
24th Annual BACUS Symposium on Photomask Technology
Wolfgang Staud; J. Tracy Weed, Editor(s)

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