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Proceedings Paper

Pellicle choice for 193-nm immersion lithography photomasks
Author(s): Eric P. Cotte; Ruediger Haessler; Benno Utess; Gunter Antesberger; Frank Kromer; Silvio Teuber
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Paper Abstract

An assessment of the mechanical performance of pellicles from different vendors was performed. Pellicle-induced distortions were experimentally measured and numerical simulations were run to predict what improvements were desirable. The experiments included mask registration measurements before and after pellicle mounting for three of the major pellicle suppliers, and adhesive gasket material properties characterization for previously untested samples. The finite element numerical simulations were verified via comparison to experimental data for pellicles with known frame bows, measured by the vendor. The models were extended to simulate the effect of the chucking of reticles in an exposure tool, as well as the various magnification correction schemes available in such tools. Results were compared to ITRS requirements to evaluate performances. This study enables the AMTC to give important feedback to pellicle suppliers and make proper recommendations to customers for future pellicle choices.

Paper Details

Date Published: 6 December 2004
PDF: 10 pages
Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); doi: 10.1117/12.569280
Show Author Affiliations
Eric P. Cotte, Advanced Mask Technology Ctr. (Germany)
Ruediger Haessler, Institut fuer Polymerforschung Dresden (Germany)
Benno Utess, Advanced Mask Technology Ctr. (Germany)
Gunter Antesberger, Advanced Mask Technology Ctr. (Germany)
Frank Kromer, Advanced Mask Technology Ctr. (Germany)
Silvio Teuber, Advanced Mask Technology Ctr. (Germany)


Published in SPIE Proceedings Vol. 5567:
24th Annual BACUS Symposium on Photomask Technology
Wolfgang Staud; J. Tracy Weed, Editor(s)

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