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Proceedings Paper

Relationship between DUV lithography and etch for pattern transfer
Author(s): Joyce Z. Witowski; Elliott Sean Capsuto; Satyendra S. Sethi; John Kochan
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Paper Details

Date Published: 1 February 1992
PDF: 13 pages
Proc. SPIE 1593, Dry Etch Technology, (1 February 1992); doi: 10.1117/12.56928
Show Author Affiliations
Joyce Z. Witowski, SEMATECH Inc. (United States)
Elliott Sean Capsuto, SEMATECH Inc. (United States)
Satyendra S. Sethi, SEMATECH Inc. (United States)
John Kochan, SEMATECH Inc. (United States)


Published in SPIE Proceedings Vol. 1593:
Dry Etch Technology
Deepak Ranadive, Editor(s)

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