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Proceedings Paper

Rasterizing for SLM-based mask making and maskless lithography
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Paper Abstract

In high fidelity SLM-based mask making and maskless lithography, a high performance rasterizer with high capability is of utmost importance. The rasterizer must be capable, not only to convert the vector format input data to a bitmap suitable for the SLM in fractions of seconds, but also to perform image adjustments in terms of edge placement and edge acuity. This paper presents a new rasterizing algorithm with built-in capability to remove virtually all influence of the finite pixel size on lithographic performance, even for printed features down to the size less than 2 pixels. The rasterizer allows the SLM to mimic the performance of any phase-shifted reticle, including strong phase-shifting and chromeless lithography. In addition, with SLM-based mask making and maskless lithography, it is possible to switch between completely different printing modes (binary, weak and strong phase-shifting, or CPL) between consecutive exposures, without the need for reticle and wafer re-alignment. The result is improved image fidelity, smaller printed features relative to the pixel grid, and flexible powerful phase-shifting capabilities.

Paper Details

Date Published: 6 December 2004
PDF: 8 pages
Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); doi: 10.1117/12.569277
Show Author Affiliations
Hans Martinsson, Micronic Laser Systems AB (Sweden)
Tor Sandstrom, Micronic Laser Systems AB (Sweden)


Published in SPIE Proceedings Vol. 5567:
24th Annual BACUS Symposium on Photomask Technology
Wolfgang Staud; J. Tracy Weed, Editor(s)

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