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Proceedings Paper

In-situ monitoring of GaAs MBE by low-energy ion scattering
Author(s): Minoru Kubo; Tadashi Narusawa
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Paper Details

Date Published: 1 February 1992
PDF: 7 pages
Proc. SPIE 1593, Dry Etch Technology, (1 February 1992); doi: 10.1117/12.56927
Show Author Affiliations
Minoru Kubo, Matsushita Electric Industrial Co., Ltd. (Japan)
Tadashi Narusawa, Matsushita Electric Industrial Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 1593:
Dry Etch Technology
Deepak Ranadive, Editor(s)

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