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Proceedings Paper

Reactive sputtering of Si/SiNx quarter-wave dielectric mirrors using in-situ laser reflectometry
Author(s): Dubravko I. Babic; Thomas E. Reynolds; Evelyn L. Hu; John Edward Bowers
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Paper Abstract

We demonstrate a computer automated system for reactive sputter deposition of silicon and silicon nitride that features a laser reflectometer as an in-situ monitoring tool. A hollow anode was designed specifically for this purpose and enables in-situ reflectivity measurements at normal incidence to the wafer. We describe the use of this system for in-situ determination of the deposition rate and the material optical properties (refraedve index and loss). Finally we describe the fabrication of high precision Si/SiNx quarter-wave dielectric mirrors for opto-electronic applications by means of an in-situ feedback control algorithm.

Paper Details

Date Published: 1 February 1992
PDF: 8 pages
Proc. SPIE 1593, Dry Etch Technology, (1 February 1992); doi: 10.1117/12.56925
Show Author Affiliations
Dubravko I. Babic, Univ. of California/Santa Barbara (United States)
Thomas E. Reynolds, Univ. of California/Santa Barbara (United States)
Evelyn L. Hu, Univ. of California/Santa Barbara (United States)
John Edward Bowers, Univ. of California/Santa Barbara (United States)

Published in SPIE Proceedings Vol. 1593:
Dry Etch Technology
Deepak Ranadive, Editor(s)

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