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Proceedings Paper

Mechanisms of silicon oxide etching in a highly polymerized fluorocarbon plasma
Author(s): Naokatsu Ikegami; Nobuo Ozawa; Yasuhiro Miyakawa; Jun Kanamori
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Paper Details

Date Published: 1 February 1992
PDF: 11 pages
Proc. SPIE 1593, Dry Etch Technology, (1 February 1992); doi: 10.1117/12.56923
Show Author Affiliations
Naokatsu Ikegami, OKI Electric Industry Co., Ltd. (Japan)
Nobuo Ozawa, OKI Electric Industry Co., Ltd. (Japan)
Yasuhiro Miyakawa, OKI Electric Industry Co., Ltd. (Japan)
Jun Kanamori, OKI Electric Industry Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 1593:
Dry Etch Technology
Deepak Ranadive, Editor(s)

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