Share Email Print

Proceedings Paper

Mask defect inspection study with high-speed mask inspection system
Author(s): Jeayoung Jun; Hyunchul Kim; Sungjin Choi; Yong Kyoo Choi; Oscar Han
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

In this study, A new inspection system with Nd:YAG laser beam has been developed to detect defects on blank mask and particles from process and handling. The development of new reflective image and optic system increased inspection speed for advanced Cr, PSM and Quartz substrate. Through easy operation and defect classification, the productivity of inspection and particle control on mask process was increased. With this new inspection system, defects on blank mask was classified and evaluated after patterning process. As a process monitoring tool, defects from all mask process equipments have been evaluated and monitored with different microscopy and metrology tools to identify and characterize them on various steps. Our results demonstrate that this process monitoring is very effective to identify defects and their sources, and to prevent mask reject caused by defect of each process.

Paper Details

Date Published: 6 December 2004
PDF: 8 pages
Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); doi: 10.1117/12.569226
Show Author Affiliations
Jeayoung Jun, Hynix Semiconductor Inc. (South Korea)
Hyunchul Kim, Hims Co., Ltd. (South Korea)
Sungjin Choi, Hynix Semiconductor Inc. (South Korea)
Yong Kyoo Choi, Hynix Semiconductor Inc. (South Korea)
Oscar Han, Hynix Semiconductor Inc. (South Korea)

Published in SPIE Proceedings Vol. 5567:
24th Annual BACUS Symposium on Photomask Technology
Wolfgang Staud; J. Tracy Weed, Editor(s)

© SPIE. Terms of Use
Back to Top