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Proceedings Paper

Phase-defocus windows for alternating phase-shifting mask
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Paper Abstract

We propose a useful methodology, called phase-defocus (P-D) window, to express the mutual dependence of Alt-PSM mask structure and the wafer process window of the pattern-position shift caused by phase error and intensity imbalance. The P-D window was predicted and optimized with a 2-D mask with effective phase and transmission by simulations. We further used rigorous E-M field simulations to correlate the 3-D mask structure to those optimized conditions. Moreover, experiments were performed with four kinds of mask structures and the best Alt-PSM structure was obtained and used to suggest the mask fabrication performance based on P-D window analysis. In order to understand the influence of mask fabrication on patterns with various densities, the common P-D window is proposed. Using the P-D window, the optimized condition was achieved with a maximum process margin for the mask and wafer. In addition, the P-D window is used to quantify the scattering effect coming from the topographical mask and determine the effective 180° for the iso-focal condition.

Paper Details

Date Published: 6 December 2004
PDF: 10 pages
Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); doi: 10.1117/12.569216
Show Author Affiliations
Fu-Jye Liang, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Chun-Kuang Chen, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Jaw-Jung Shin, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Jan-Wen You, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Chun-Heng Lin, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Zhin-Yu Pan, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
King-Chang Shu, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Tsai-Sheng Gau, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Burn J. Lin, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)


Published in SPIE Proceedings Vol. 5567:
24th Annual BACUS Symposium on Photomask Technology
Wolfgang Staud; J. Tracy Weed, Editor(s)

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