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Proceedings Paper

E-beam mask repair: fundamental capability and applications
Author(s): Ted Liang; Eric Frendberg; Daniel J. Bald; Michael Penn; Alan R. Stivers
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Paper Abstract

We have installed the industry's first commercial electron beam mask repair tool in Intel's mask shop. In this paper we describe our on-going efforts of developing e-beam repair processes for binary, phase-shifting and EUVL masks. We present a complete characterization of fundamental capabilities of e-beam repair and make general comparisons with other technologies, in terms of repair resolutions, substrate damage, edge placement, removal selectivity, and process margin. Among many applications, results from quartz etch with excellent resolution and vertical profile are described.

Paper Details

Date Published: 6 December 2004
PDF: 11 pages
Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); doi: 10.1117/12.569210
Show Author Affiliations
Ted Liang, Intel Corp. (United States)
Eric Frendberg, Intel Corp. (United States)
Daniel J. Bald, Intel Corp. (United States)
Michael Penn, Intel Corp. (United States)
Alan R. Stivers, Intel Corp. (United States)

Published in SPIE Proceedings Vol. 5567:
24th Annual BACUS Symposium on Photomask Technology
Wolfgang Staud; J. Tracy Weed, Editor(s)

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