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Proceedings Paper

Correlation of real-time-monitored process module parameters and wafer results
Author(s): Terry R. Turner
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Paper Details

Date Published: 1 February 1992
PDF: 12 pages
Proc. SPIE 1593, Dry Etch Technology, (1 February 1992); doi: 10.1117/12.56921
Show Author Affiliations
Terry R. Turner, SEMATECH/Texas Instruments (United States)


Published in SPIE Proceedings Vol. 1593:
Dry Etch Technology
Deepak Ranadive, Editor(s)

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