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Proceedings Paper

Study of relationship between silylated profile and resist profile through variation in the process condition and resist materials in the DESIRE process
Author(s): Kazuo Taira; Junichi Takahashi; Kazunori Kato; Kenji Yanagihara
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Paper Details

Date Published: 1 February 1992
PDF: 15 pages
Proc. SPIE 1593, Dry Etch Technology, (1 February 1992); doi: 10.1117/12.56919
Show Author Affiliations
Kazuo Taira, Japan Synthetic Rubber Co., Ltd. (Japan)
Junichi Takahashi, Japan Synthetic Rubber Co., Ltd. (Japan)
Kazunori Kato, Japan Synthetic Rubber Co., Ltd. (Japan)
Kenji Yanagihara, Japan Synthetic Rubber Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 1593:
Dry Etch Technology
Deepak Ranadive, Editor(s)

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