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Proceedings Paper

ECR plasma and etch characterization of photoresist dry etch processes
Author(s): Kyoung Youn Cho; Dong Won Im
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Paper Details

Date Published: 1 February 1992
PDF: 11 pages
Proc. SPIE 1593, Dry Etch Technology, (1 February 1992); doi: 10.1117/12.56918
Show Author Affiliations
Kyoung Youn Cho, Samsung Electronics (South Korea)
Dong Won Im, Samsung Electronics (South Korea)

Published in SPIE Proceedings Vol. 1593:
Dry Etch Technology
Deepak Ranadive, Editor(s)

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