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Proceedings Paper

Interferometric monitoring and control of silicon incorporation in the diffusion-enhanced silylated resist process
Author(s): Maureen A. Hanratty; Ajit P. Paranjpe; Steven A. Henck; Rhett Barry Jucha
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Paper Details

Date Published: 1 February 1992
PDF: 12 pages
Proc. SPIE 1593, Dry Etch Technology, (1 February 1992); doi: 10.1117/12.56917
Show Author Affiliations
Maureen A. Hanratty, Texas Instruments Inc. (United States)
Ajit P. Paranjpe, Texas Instruments Inc. (United States)
Steven A. Henck, Texas Instruments Inc. (United States)
Rhett Barry Jucha, Texas Instruments Inc. (United States)


Published in SPIE Proceedings Vol. 1593:
Dry Etch Technology
Deepak Ranadive, Editor(s)

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