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Proceedings Paper

Consideration on the resolution limit of the resist silylated process
Author(s): Keisuke Tanimoto; Hiroyuki Komeda; Daisuke Takehara; Ryohei Kawabata; Hikou Shibayama
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Paper Details

Date Published: 1 February 1992
PDF: 11 pages
Proc. SPIE 1593, Dry Etch Technology, (1 February 1992); doi: 10.1117/12.56915
Show Author Affiliations
Keisuke Tanimoto, Sharp Corp. (Japan)
Hiroyuki Komeda, Sharp Corp. (Japan)
Daisuke Takehara, Sharp Corp. (Japan)
Ryohei Kawabata, Sharp Corp. (Japan)
Hikou Shibayama, Sharp Corp. (Japan)

Published in SPIE Proceedings Vol. 1593:
Dry Etch Technology
Deepak Ranadive, Editor(s)

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