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Proceedings Paper

Surface contamination control during plasma etching
Author(s): Hiroshi Miyatake; K. Kawai; Nobuo Fujiwara; Masahiro Yoneda; K. Nishioka; Haruhiko Abe
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Paper Details

Date Published: 1 February 1992
PDF: 8 pages
Proc. SPIE 1593, Dry Etch Technology, (1 February 1992); doi: 10.1117/12.56914
Show Author Affiliations
Hiroshi Miyatake, Mitsubishi Electric Corp. (Japan)
K. Kawai, Mitsubishi Electric Corp. (Japan)
Nobuo Fujiwara, Mitsubishi Electric Corp. (Japan)
Masahiro Yoneda, Mitsubishi Electric Corp. (Japan)
K. Nishioka, Mitsubishi Electric Corp. (Japan)
Haruhiko Abe, Mitsubishi Electric Corp. (Japan)

Published in SPIE Proceedings Vol. 1593:
Dry Etch Technology
Deepak Ranadive, Editor(s)

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