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Proceedings Paper

Image-based metrology software for analysis of features on masks and wafers
Author(s): Saghir Munir; Daniel J. Bald; Vikram Tolani; Horst Haussecker
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Paper Abstract

Tebaldi is a software tool developed at Intel Mask Operation (IMO) for quantitatively analyzing patterns in 2D. Its initial scope was to analyze aerial images taken with a microscope. However the software has recently been enhanced to support aerial images obtained through simulation, bitmap, jpeg and tiff files saved from the mask inspection systems and the scanning electron microscope (SEM). This article primarily focuses on the SEM module of the software. Tebaldi supports simulated aerial images generated through IMO’s simulation based defect disposition system. This allows engineers to directly correlate 2D structures in an experimental aerial image, with those in a simulated image. To analyze SEM images, the software features scaling, alignment and calibration functions. Several linear and non-linear filtration techniques to reduce noise and charging exist. Custom convolution kernels can be user defined. Ability to segment features and extract contours also exist. Further, these contours can be overlayed and shortest distances between corresponding points can be computed in a user friendly manner with a high degree of confidence. Tebaldi is currently used in production to disposition defects in repaired sites on masks shipped from IMO as well as to compare SEM images to determine the pattern fidelity across mask writers and processes within IMO.

Paper Details

Date Published: 6 December 2004
PDF: 6 pages
Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); doi: 10.1117/12.569135
Show Author Affiliations
Saghir Munir, Intel Corp. (United States)
Daniel J. Bald, Intel Corp. (United States)
Vikram Tolani, Intel Corp. (United States)
Horst Haussecker, Intel Corp. (United States)


Published in SPIE Proceedings Vol. 5567:
24th Annual BACUS Symposium on Photomask Technology
Wolfgang Staud; J. Tracy Weed, Editor(s)

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