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Proceedings Paper

Wafer charging in different types of plasma etchers
Author(s): Takashi Namura; Hirofumi Uchida; Hiroyuki Okada; Atsushi Koshio; Satoshi Nakagawa; Yoshihiro Todokoro; Morio Inoue
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Paper Details

Date Published: 1 February 1992
PDF: 12 pages
Proc. SPIE 1593, Dry Etch Technology, (1 February 1992); doi: 10.1117/12.56911
Show Author Affiliations
Takashi Namura, Matsushita Electronics Corp. (Japan)
Hirofumi Uchida, Matsushita Electronics Corp. (Japan)
Hiroyuki Okada, Matsushita Electronics Corp. (Japan)
Atsushi Koshio, Matsushita Electronics Corp. (Japan)
Satoshi Nakagawa, Matsushita Electronics Corp. (Japan)
Yoshihiro Todokoro, Matsushita Electronics Corp. (Japan)
Morio Inoue, Matsushita Electronics Corp. (Japan)


Published in SPIE Proceedings Vol. 1593:
Dry Etch Technology
Deepak Ranadive, Editor(s)

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