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Proceedings Paper

Mask defect reduction through automated pellicle mounting
Author(s): Richard E. Wistrom; Dennis Hayden; Timothy Neary
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Paper Abstract

At IBM’s Mask House, we deigned, installed, and evaluated a fully automated pellicle mounting tool. Features include very low particulate levels, ability to mount a wide variety of pellicles, ease of operation, and pellicle and mask inspection capability. During an evaluation period, pellicles were mounted both with this fully automated tool and with a semiautomatic tool. The fully automated tool showed good reliability (>95% availability) and a 2X lower incidence of foreign material contemination as compared with the semiautomatic tool.

Paper Details

Date Published: 6 December 2004
PDF: 7 pages
Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); doi: 10.1117/12.569061
Show Author Affiliations
Richard E. Wistrom, IBM Microelectronics (United States)
Dennis Hayden, IBM Microelectronics (United States)
Timothy Neary, IBM Microelectronics (United States)


Published in SPIE Proceedings Vol. 5567:
24th Annual BACUS Symposium on Photomask Technology
Wolfgang Staud; J. Tracy Weed, Editor(s)

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