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Proceedings Paper

Immersion mask inspection with hybrid-microscopic systems at 193 nm
Author(s): Robert Brunner; Alexander Menck; Reinhard Steiner; Gerd Buchda; Steffen Weissenberg; Uwe Horn; Axel M. Zibold
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Paper Abstract

The capability of a high NA, large working distance, microscope objective was demonstrated by investigating different mask features. The microscope objective is based on a hybrid concept combining diffractive and refractive optical elements. Resolution down to 125 nm lines and spaces (L/S) is demonstrated by investigating periodic chrome on glass structures. A significant additional improvement of the resolution is achieved by inducing a solid immersion lens (SIL).

Paper Details

Date Published: 6 December 2004
PDF: 7 pages
Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); doi: 10.1117/12.569019
Show Author Affiliations
Robert Brunner, Carl Zeiss Jena GmbH (Germany)
Alexander Menck, Carl Zeiss SMS GmbH (Germany)
Reinhard Steiner, Carl Zeiss Jena GmbH (Germany)
Gerd Buchda, Carl Zeiss Jena GmbH (Germany)
Steffen Weissenberg, Carl Zeiss SMS GmbH (Germany)
Uwe Horn, Carl Zeiss SMS GmbH (Germany)
Axel M. Zibold, Carl Zeiss SMS GmbH (Germany)

Published in SPIE Proceedings Vol. 5567:
24th Annual BACUS Symposium on Photomask Technology
Wolfgang Staud; J. Tracy Weed, Editor(s)

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