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Proceedings Paper

Updates on the coefficient of thermal expansion property and surface finish capability of CLEARCERAM-Z series for EUVL photomask substrate application
Author(s): Kousuke Nakajima; Toshihide Nakajima
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Paper Abstract

CLEARCERAM®-Z HS is a low thermal expansion glass-ceramics and has been used in semiconductor industry field as well as for various precision applications. Extreme Ultra Violet Lithography (EUVL) is one of the applications, in which future utilization of CLEARCERAM®-Z HS can be expected. Previous reports revealed that CLEARCERAM®-Z HS met the material requirements in the SEMI spec. This paper refers to the latest investigation results on the CTE & surface finish performance of CLEARCERAM®-Z HS relative to the SEMI spec. Also the data obtained from the development of new CLEARCERAM®-Z, which is designed for more fit with EUVL applications, will be presented and its advantageous potential for EUVL Photomask substrate application is to be discussed.

Paper Details

Date Published: 6 December 2004
PDF: 12 pages
Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); doi: 10.1117/12.569009
Show Author Affiliations
Kousuke Nakajima, OHARA Inc. (Japan)
Toshihide Nakajima, OHARA Inc. (Japan)

Published in SPIE Proceedings Vol. 5567:
24th Annual BACUS Symposium on Photomask Technology
Wolfgang Staud; J. Tracy Weed, Editor(s)

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